10 June 2006 Measurement of polymerizing fluorocarbon plasma parameters: dynamic Langmuir probe technique application
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Proceedings Volume 6260, Micro- and Nanoelectronics 2005; 62600A (2006) https://doi.org/10.1117/12.677021
Event: Micro- and Nanoelectronics 2005, 2005, Zvenigorod, Russian Federation
Abstract
In present paper the description of dynamic Langmuir probe technique is given and the results on plasma parameters obtained in ICP-discharge in pure CHF3 gas are discussed. It was proven that using of DLP-technique is the way to obtain relevant probe data in polymerizing plasmas. Side effects of the thermionic emission from probe tip were revealed. Although emissive probes can be used to simple measure of plasma space potential, the emission can cause sufficient distortion of I-V curve, measured values of electron temperature, and EEDF curve. The effect of emission was experimentally measured and corresponding work function of electrons from probe surface was estimated.
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A. Miakonkikh, A. Miakonkikh, K. Rudenko, K. Rudenko, } "Measurement of polymerizing fluorocarbon plasma parameters: dynamic Langmuir probe technique application", Proc. SPIE 6260, Micro- and Nanoelectronics 2005, 62600A (10 June 2006); doi: 10.1117/12.677021; https://doi.org/10.1117/12.677021
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