10 June 2006 Metrology in linear measurements of nano-object elements
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Proceedings Volume 6260, Micro- and Nanoelectronics 2005; 626013 (2006) https://doi.org/10.1117/12.683398
Event: Micro- and Nanoelectronics 2005, 2005, Zvenigorod, Russian Federation
Problems of nanoobject linear size measurements on scanning electron microscopes (SEM) have been discussed. It is suggested to use the relief pitch structures of the MShPS-2.0K measure as the line width standard. The geometrical model of signal formation by these structures on high and low voltage SEM's has been described. SEM calibration methods, including measurement of the magnification and diameter of the electron probe, have been developed on the basis of this model. Real structure line width measurement methods have been developed allowing measurements of down to 50 nm.
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Yu. A. Novikov, Yu. A. Novikov, A. V. Rakov, A. V. Rakov, P. A. Todua, P. A. Todua, "Metrology in linear measurements of nano-object elements", Proc. SPIE 6260, Micro- and Nanoelectronics 2005, 626013 (10 June 2006); doi: 10.1117/12.683398; https://doi.org/10.1117/12.683398

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