10 June 2006 The surface roughness investigation by the atomic force microscopy, x-ray scattering, and light scattering
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Proceedings Volume 6260, Micro- and Nanoelectronics 2005; 62601A (2006) https://doi.org/10.1117/12.683482
Event: Micro- and Nanoelectronics 2005, 2005, Zvenigorod, Russian Federation
Abstract
Roughness investigation of the polished quartz and sital substrates, used as substrates for multilayer interference mirrors in circle laser gyroscopes, were carried out. Atomic force microscopy, x-ray scattering and angle-resolved scattering instruments were used. The power spectral density function and effective rms roughness were calculated. Good correlation of power spectral density functions and effective rms roughness was shown for all instruments. Essentially difference of the polishing quality was shown for sital substrates manufactured by two different producers.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. L. Zanaveskin, M. L. Zanaveskin, Yu. V. Grishchenko, Yu. V. Grishchenko, A. L. Tolstikhina, A. L. Tolstikhina, V. E. Asadchikov, V. E. Asadchikov, B. S. Roshchin, B. S. Roshchin, V. V. Azarova, V. V. Azarova, } "The surface roughness investigation by the atomic force microscopy, x-ray scattering, and light scattering", Proc. SPIE 6260, Micro- and Nanoelectronics 2005, 62601A (10 June 2006); doi: 10.1117/12.683482; https://doi.org/10.1117/12.683482
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