7 June 2006 Nanoprocessing of silicon substrate using surface plasmon polaritons of gold particle and polystyrene particle excited by femtosecond laser
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Proceedings Volume 6261, High-Power Laser Ablation VI; 62612S (2006) https://doi.org/10.1117/12.674501
Event: High-Power Laser Ablation 2006, 2006, Taos, NM, United States
Abstract
Nanohole processing of silicon substrate using surface plasmon polaritons of nano gold excited by femtosecond laser is described in comparison with the nanohole processing with transparent polystyrene (PS) nanoparticle template. Gold particles with diameters of 40, 80, or 200 nm are spin coated on the substrate, and a 100 fs, 820 nm laser pulse is used to irradiate the samples. The produced holes are analyzed by scanning electron microscopy and atomic force microscopy. A theoretical analysis of the experimental results is conducted by FDTD (Finite Difference Time Domain) simulation. The dependence of the laser fluence and particle size on the nanohole properties is studied. The nanohole profiles correspond to the field distributions on the Si substrate at low fluence region. A highest electric field enhancement factor of about 26 is obtained for gold particles with a diameter of 200 nm.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tomoya Miyanishi, Tomoya Miyanishi, Hiroto Takada, Hiroto Takada, Nikolay N. Nedyalkov, Nikolay N. Nedyalkov, Makoto Hasegawa, Makoto Hasegawa, Minoru Obara, Minoru Obara, } "Nanoprocessing of silicon substrate using surface plasmon polaritons of gold particle and polystyrene particle excited by femtosecond laser", Proc. SPIE 6261, High-Power Laser Ablation VI, 62612S (7 June 2006); doi: 10.1117/12.674501; https://doi.org/10.1117/12.674501
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