Paper
7 July 2006 Fabrication and characteristics of free-standing shaped pupil masks for TPF-coronagraph
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Abstract
Direct imaging and characterization of exo-solar terrestrial planets require coronagraphic instruments capable of suppressing star light to 10-10. Pupil shaping masks have been proposed and designed1 at Princeton University to accomplish such a goal. Based on Princeton designs, free standing (without a substrate) silicon masks have been fabricated with lithographic and deep etching techniques. In this paper, we discuss the fabrication of such masks and present their physical and optical characteristics in relevance to their performance over the visible to near IR bandwidth.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kunjithapatham Balasubramanian, Pierre M. Echternach, Matthew R. Dickie, Richard E. Muller, Victor E. White, Daniel J. Hoppe, Stuart B. Shaklan, Ruslan Belikov, N. Jeremy Kasdin, Robert J. Vanderbei, Daniel Ceperley, and Andrew R. Neureuther "Fabrication and characteristics of free-standing shaped pupil masks for TPF-coronagraph", Proc. SPIE 6265, Space Telescopes and Instrumentation I: Optical, Infrared, and Millimeter, 62653N (7 July 2006); https://doi.org/10.1117/12.673251
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CITATIONS
Cited by 11 scholarly publications.
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KEYWORDS
Photomasks

Silicon

Etching

Coronagraphy

Deep reactive ion etching

Manufacturing

Semiconducting wafers

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