Paper
13 June 2006 Performance characterization of silicon pore optics
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Abstract
The characteristics of the latest generation of assembled silicon pore X-ray optics are discussed in this paper. These very light, stiff and modular high performance pore optics (HPO) have been developed [1] for the next generation of astronomical X-ray telescopes, which require large collecting areas whilst achieving angular resolutions better than 5 arcseconds. The suitability of 12 inch silicon wafers as high quality optical mirrors and the automated assembly process are discussed elsewhere in this conference. HPOs with several tens of ribbed silicon plates are assembled by bending the plates into an accurate cylindrical shape and directly bonding them on top of each other. The achievable figure accuracy is measured during assembly and in test campaigns at X-ray testing facilities like BESSY-II and PANTER. Pencil beam measurements allow gaining information on the quality achieved by the production process with high spatial resolution. In combination with full beam illumination a complete picture of the excellent performance of these optics can be derived. Experimental results are presented and discussed in detail. The results of such campaigns are used to further improve the production process in order to match the challenging XEUS requirements [2] for imaging resolution and mass.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. J. Collon, S. Kraft, R. Günther, E. Maddox, M. Beijersbergen, M. Bavdaz, D. Lumb, K. Wallace, M. Krumrey, L. Cibik, and M. Freyberg "Performance characterization of silicon pore optics", Proc. SPIE 6266, Space Telescopes and Instrumentation II: Ultraviolet to Gamma Ray, 62661T (13 June 2006); https://doi.org/10.1117/12.673268
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Cited by 9 scholarly publications.
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KEYWORDS
X-rays

Silicon

X-ray optics

Optical fabrication

Spatial resolution

Wafer-level optics

Computer generated holography

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