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6 July 2006 Analysis for method of creating thin film masks of arbitrarily varying transmittance
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Abstract
A new technique for creating optical masks with a transmittance that varies spatially according to an arbitrary usersupplied equation is discussed. Initial fabrication and testing demonstrates the viability of the technique, as well as showing the effect of various deposition parameters in the resulting product. The test data are compared to both simulated and ideal results. The application of this technique to the creation of a coronagraphic filter with strong central attenuation and minimal edge diffraction is also discussed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Catherine Boone, Martina Reale, and Stephen Somerstein "Analysis for method of creating thin film masks of arbitrarily varying transmittance", Proc. SPIE 6273, Optomechanical Technologies for Astronomy, 627320 (6 July 2006); https://doi.org/10.1117/12.673005
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