31 May 2006 Vacuum technological equipment for microphotoelectronic production
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Proceedings Volume 6278, Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics; 62780A (2006) https://doi.org/10.1117/12.693205
Event: Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics, 2005, Moscow, Russian Federation
Abstract
The paper presents a series of electron-beam and ion-plasma installations for microphotoelectronic industry. The vacuum film deposition installation allows conducting unbreakable process of ion-beam etching, magnetron sputtering, and resistance-heated evaporation aimed to make a multi-component contact with the p-type semiconductor regions. Using the low-energy ions for substrate cleaning and etching reduces radiation damage of the substrate material and helps to avoid p-region inversion. The ion-beam etching installation is designed to etch semiconductor and metal materials in either inert or reactive gas environment to produce silicon MOS multiplexors. The electron-beam welding installation is designed for sealing the evacuated cases of photodiode array detectors.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. N. Kozlov, A. N. Kozlov, I. S. Gaidoukova, I. S. Gaidoukova, A. G. Uvaev, A. G. Uvaev, A. B. Scherbakov, A. B. Scherbakov, A. M. Filachev, A. M. Filachev, } "Vacuum technological equipment for microphotoelectronic production", Proc. SPIE 6278, Seventh Seminar on Problems of Theoretical and Applied Electron and Ion Optics, 62780A (31 May 2006); doi: 10.1117/12.693205; https://doi.org/10.1117/12.693205
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