21 June 2006 Nanoimprint lithography techniques: an introduction
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Proceedings Volume 6281, 22nd European Mask and Lithography Conference; 62810N (2006) https://doi.org/10.1117/12.692648
Event: 22nd European Mask and Lithography Conference, 2006, Dresden, Germany
Abstract
The main nanoimprint lithography techniques are highlighted in this paper. In addition to details concerning the materials used and the basic processing techniques, some of the major recent developments are summarized. Critical issues are addressed and some ideas for improvement are given. The paper aims to give an introduction to the techniques and a survey of the actual status without going into the details of the specific techniques.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H.-C. Scheer, H.-C. Scheer, } "Nanoimprint lithography techniques: an introduction", Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 62810N (21 June 2006); doi: 10.1117/12.692648; https://doi.org/10.1117/12.692648
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