Sulfate-free photomask cleaning technology

Shingo Anzai; Noriaki Takagi; Tomoaki Kamiyama; Naotoshi Kawaguchi; Mikio Ishijima; Toshimitsu Watanabe; Hiroaki Morimoto; Tsuneaki Kuwajima; Makito Nakatsu; Shin-ichi Hasegawa

doi:10.1117/12.681737

20 May 2006 Sulfate-free photomask cleaning technology

Shingo Anzai, Noriaki Takagi, Tomoaki Kamiyama, Naotoshi Kawaguchi, Mikio Ishijima, Toshimitsu Watanabe, Hiroaki Morimoto, Tsuneaki Kuwajima, Makito Nakatsu, Shin-ichi Hasegawa

Author Affiliations +

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62830B (2006) https://doi.org/10.1117/12.681737
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

To eliminate ammonium sulfate haze caused from sulfuric acid residue on the mask surface, we have been working for resist stripping and cleaning without the use of sulfuric acid process. This paper describes sulfate-free photomask cleaning technology by improving ozone cleaning process.

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Shingo Anzai, Noriaki Takagi, Tomoaki Kamiyama, Naotoshi Kawaguchi, Mikio Ishijima, Toshimitsu Watanabe, Hiroaki Morimoto, Tsuneaki Kuwajima, Makito Nakatsu, and Shin-ichi Hasegawa "Sulfate-free photomask cleaning technology", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830B (20 May 2006); https://doi.org/10.1117/12.681737

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