20 May 2006 A study of damage mechanisms during EUV mask substrate cleaning
Author Affiliations +
Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62830I (2006) https://doi.org/10.1117/12.681841
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan
Defects on an extreme ultraviolet (EUV) mask blank strongly depend on the defects on the mask blank substrate. Any imperfection on the substrate surface in the form of a particle, pit, and scratch will appear on the EUV mask blank. In this article, we study the effect of the cleaning process on the creation of defects on the EUV substrate and mask blank. Added particles could be removed by improving the cleaning tool and the cleaning process. Pits are generally created when many large defects, particularly glass-like materials, are present on the surface and the substrate is exposed to a high energy cleaning step. Comparison of different high energy steps in a typical cleaning process suggests that the megasonic step most likely creates pits. Current cleaning processes developed in the Mask Blank Development Center (MBDC) have been optimized so that no added pits or particles are observed after using them.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Abbas Rastegar, Abbas Rastegar, Sean Eichenalub, Sean Eichenalub, Kurt Goncher, Kurt Goncher, Pat Marmillion, Pat Marmillion, } "A study of damage mechanisms during EUV mask substrate cleaning", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830I (20 May 2006); doi: 10.1117/12.681841; https://doi.org/10.1117/12.681841


Sub-30-nm defect removal on EUV substrates
Proceedings of SPIE (May 27 2009)
Nanopit smoothing by cleaning
Proceedings of SPIE (March 17 2009)
Development of EUVL mask blank in AGC
Proceedings of SPIE (October 20 2006)
Sub 50 nm cleaning-induced damage in EUV mask blanks
Proceedings of SPIE (April 01 2008)

Back to Top