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20 May 2006 Advanced mask rule check (MRC) tool
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Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62830O (2006)
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan
As patterns on photomasks are getting more complex due to RET technologies, mask rule check (MRC) has become an essential process before manufacturing photomasks. Design rule check (DRC) tools in the EDA field can be applied for MRC. However, photomask data has unique characteristics different from IC design, which causes many problems when handling photomask data in the same way as the design data. In this paper, we introduce a novel MRC tool, SmartMRC, which has been developed by SII NanoTechnology in order to solve these problems and show the experimental results performed by DNP. We have achieved high performance of data processing by optimizing the software engine to make the best use of mask data's characteristics. The experimental results show that only a little difference has been seen in calculation time for reversed pattern data compared to non-reversed data. Furthermore, the MRC tool can deal with various types of photomask data and Jobdec in the same transparent way by reading them directly without any intermediate data conversion, which helps to reduce the overhead time. Lastly it has been proven that result OASIS files are several times smaller than GDS files.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, Koki Kuriyama, Toshio Suzuki, Shogo Narukawa, and Naoya Hayashi "Advanced mask rule check (MRC) tool", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830O (20 May 2006);


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