Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry

Kyung-man Lee; Sanjay Yedur; Wen-hao Cheng; Malahat Tavassoli; Kiho Baik

doi:10.1117/12.681864

3 May 2006 Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry

Kyung-man Lee, Sanjay Yedur, Wen-hao Cheng, Malahat Tavassoli, Kiho Baik

Author Affiliations +

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 628313 (2006) https://doi.org/10.1117/12.681864
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Control of line width and profile is gaining more importance in photomask processes as the industry moves toward 45nm node and beyond. In this paper we report scatterometer measurements of CD and profile data from chrome-less mask profile processed using Intel's 65nm and 45nm node technology. As opposed to the highly charging nature of chrome-less plate during CD SEM measurements, scatterometry provides a non-charging optical alternative to measure critical CDs. As for trench depth measurement, scatterometry has big advantage over AFM with its much higher throughput (about 5 seconds vs. >2min). Since quartz plate is very transmittive to lights, we use eliipsometer-based scatterometry instead of conventional reflective-photometer based one. Parameters characterized in this study include line/space CD, contact CD, and trench depth. Correlation to top-down CD-SEM, cross-sectional SEM, and AFM is reported. Line CD uniformity reduction is more than 30% compared to that from CDSEM, due to averaging effect of scatterometry as well less lack of charging during measurements. Depth bias to AFM was around 3nm in both DCCD and FCCD height measurements we performed. The data show that Scatterometry provides a nondestructive way to monitor basic etch profile combined with relatively little time loss from measurement step.

Citation Download Citation

Kyung-man Lee, Sanjay Yedur, Wen-hao Cheng, Malahat Tavassoli, and Kiho Baik "Scatterometry based CD and profile metrology of chrome-less masks using optical digital profilometry", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628313 (3 May 2006); https://doi.org/10.1117/12.681864

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE