20 May 2006 Assurance of CD for 45-nm half-pitch with immersion microscope
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Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 628314 (2006) https://doi.org/10.1117/12.681866
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan
Abstract
A new calibration method for critical dimension (CD) linearity improvement with an immersion microscope is proposed. Correlation tables of an edge position against CD of the clear pattern and CD of the dark pattern are obtained experimentally. The detected edge position is calibrated with the correction tables. Distance between the calibrated edge positions is output as CD. The experiment result indicates the calibration method improves CD linearity of an immersion microscope. CD repeatability with the calibration method using an immersion microscope is found to be sufficient for 45nm HP masks. As a result, an immersion microscope with our calibration method is available for CD measurement of 45 nm HP masks.
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Takeshi Yamane, Takeshi Yamane, Rikiya Taniguchi, Rikiya Taniguchi, Takashi Hirano, Takashi Hirano, } "Assurance of CD for 45-nm half-pitch with immersion microscope", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628314 (20 May 2006); doi: 10.1117/12.681866; https://doi.org/10.1117/12.681866
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