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20 May 2006 Influence of the pellicle on final photomask flatness
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Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 628326 (2006) https://doi.org/10.1117/12.681775
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan
Abstract
Photomask pellicles play an important role in determining final photomask flatness, which is important to photomask optical performance. This study explores the impact of the pellicle frame flatness and pellicle-to-mask adhesive on photomask flatness. In addition, the change in mask flatness as a function of time after pellicle mounting is studied. Implications of these results on photomask manufacture and photolithography are discussed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard Wistrom, Dennis Hayden, Kenneth Racette, Monica Barrett, and Andrew Watts "Influence of the pellicle on final photomask flatness", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628326 (20 May 2006); https://doi.org/10.1117/12.681775
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