20 May 2006 From GDSII to OASIS: practical support tools for data processing flow transition
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Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62832P (2006) https://doi.org/10.1117/12.681802
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan
Abstract
OASIS format has begun to be accepted in the field of mask data processing gradually. Major EDA venders have announced their support of OASIS format and new versions of EDA tools which can handle with OASIS files have been shipped one by one. Still, there are great difficulties to convert all the data processing flow from old GDSII to new OASIS. One of the major issues is a problem of verification. Since all the tools have not been completely stable and reliable, there should be a method to verify whether the data is converted to OASIS without any problems. In addition to that, the integrity of the OASIS files itself have to be checked. In general, OASIS has two aspects for the mask industry. One is a role as a new replacement of GDSII. The other is OASIS.VSB, which is a unified format defined for the description of fractured EB data. SII NanoTechnology has been developing a new software package called SmartOASIS. SmartOASIS provides lots of practical functions to enable easy transition of data processing flow from conventional GDSII or EB formats to OASIS.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masakazu Endo, Kuninori Nishizawa, Kokoro Kato, "From GDSII to OASIS: practical support tools for data processing flow transition", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832P (20 May 2006); doi: 10.1117/12.681802; https://doi.org/10.1117/12.681802
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