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20 May 2006 Unifying the RET design flow with portable modeling information
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Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62832V (2006) https://doi.org/10.1117/12.681812
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan
Abstract
The RET Design Flow has become a conglomeration of various point tools and methodologies. Deep sub-wavelength DFM requirements have forced the design and manufacturing communities into very tight collaboration. EDA is also driven to provide an infrastructure to facilitate communication for these communities. Having this infrastructure in place has a direct impact on productivity and quality for which the value added is emphasized here.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jason Sweis, Wolf Staud, Bob Naber, Tom Laidig, and Doug Van Denbroeke "Unifying the RET design flow with portable modeling information", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832V (20 May 2006); https://doi.org/10.1117/12.681812
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