Characterisation of optical thin films obtained by plasma ion assisted deposition

Frank Placido; Des Gibson; Ewan Waddell; Edward Crossan

doi:10.1117/12.681027

28 August 2006 Characterisation of optical thin films obtained by plasma ion assisted deposition

Frank Placido, Des Gibson, Ewan Waddell, Edward Crossan

Author Affiliations +

Proceedings Volume 6286, Advances in Thin-Film Coatings for Optical Applications III; 628602 (2006) https://doi.org/10.1117/12.681027
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Optical thin films deposited using plasma ion assisted deposition (PAD) are characterized by ellipsometry, spectrophotometry and nano-indentation. PAD utilizes a dc voltage between an anode and a hot cathode, creating a high-density plasma that is extracted by an electromagnetic field. The assisted source allows denser, more stable films with higher refractive indices to be deposited without additional heating of the substrates. The primary advantage of the plasma compared to the ion source approach is that the plasma fills the vacuum chamber and couples into the evaporant, inducing partial ionization.

Citation Download Citation

Frank Placido, Des Gibson, Ewan Waddell, and Edward Crossan "Characterisation of optical thin films obtained by plasma ion assisted deposition", Proc. SPIE 6286, Advances in Thin-Film Coatings for Optical Applications III, 628602 (28 August 2006); https://doi.org/10.1117/12.681027

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