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7 September 2006 Interaction of vacuum ultraviolet radiation with molecular deposits
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Abstract
Recent quartz crystal microbalance measurements made in the Marshall Space Flight Center, Photo-deposition Facility, for several materials, recorded a significant loss of deposited contaminants when the deposition surface of the microbalance was illuminated by a deuterium lamp. Theses measurements differ from observations made by other investigators in which the rate of deposition increased significantly when the deposition surface was illuminated with vacuum ultraviolet radiation, generated by a variety of sources. These observations suggest that the accelerated deposition of molecular contaminants on optically sensitive surfaces is dependant upon the contaminant being deposited and the VUV source and that both must be addressed during the materials screening process.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
K. Albyn and H. D. Burns "Interaction of vacuum ultraviolet radiation with molecular deposits", Proc. SPIE 6291, Optical Systems Degradation, Contamination, and Stray Light: Effects, Measurements, and Control II, 62910H (7 September 2006); https://doi.org/10.1117/12.677654
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