Paper
7 September 2006 Activation of arsenic in epitaxial Hg1-xCdxTe (MCT)
P. Capper, D. Shaw
Author Affiliations +
Abstract
This paper reviews arsenic (As) dopant activation processes in the various forms of epitaxial MCT. Extrinsic doping of MCT is an important part of MCT technology and As doping is preferred as it is a shallow acceptor dopant with low diffusivity and 100% activation can be achieved under the correct growth and/or post-growth annealing conditions. It is, however, amphoteric so that under Te-rich growth conditions it can be incorporated as a donor (AsHg) and under metal-rich conditions as an acceptor (As'Te). For As concentrations up to ~ 2 × 1018 cm-3 the amphoteric model provides a satisfactory basis for explaining the behavior on annealing layers at temperatures above ~ 250 oC. Under Te-rich conditions in LPE- and MBE-grown layers can be either compensated n-type or the As can be inactive. The quantitative model of Schaake is used to obtain an expression for the activation anneal time in terms of As concentration, layer thickness, composition and temperature. Layers grown by MOVPE can show up to 100% acceptor activation if the stoichiometric conditions during the CdTe growth cycle of the interdiffused multilayer (IMP) process are maintained as metal-rich. In as-grown MBE layers the evidence indicates that As is incorporated in the form of tetramers that can dissociate at higher temperatures. The issue of establishing whether layers are electrically intrinsic at the annealing temperatures used to activate the As acceptor in LPE and MBE layers is also discussed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Capper and D. Shaw "Activation of arsenic in epitaxial Hg1-xCdxTe (MCT)", Proc. SPIE 6294, Infrared and Photoelectronic Imagers and Detector Devices II, 62940M (7 September 2006); https://doi.org/10.1117/12.680250
Lens.org Logo
CITATIONS
Cited by 4 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Mercury

Tellurium

Arsenic

Mid-IR

Long wavelength infrared

Cadmium

Liquid phase epitaxy

RELATED CONTENT

Diffusion In Cadmium Mercury Telluride
Proceedings of SPIE (September 12 1989)
Simulation of MWIR and LWIR photodiodes based on n+ p...
Proceedings of SPIE (October 08 2007)
As-doping HgCdTe by MBE
Proceedings of SPIE (January 10 2005)
Recent progress in the doping of MBE HgCdTe
Proceedings of SPIE (September 01 1995)
HgCdTe FPAs made by arsenic-ion implantation
Proceedings of SPIE (May 15 2008)

Back to Top