Is entanglement dispensable in quantum lithography?

Milena D'Angelo; Giuliano Scarcelli; Yanhua Shih

doi:10.1117/12.696336

30 August 2006 Is entanglement dispensable in quantum lithography?

Milena D'Angelo, Giuliano Scarcelli, Yanhua Shih

Proceedings Volume 6305, Quantum Communications and Quantum Imaging IV; 63050X (2006) https://doi.org/10.1117/12.696336
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

The working principle of quantum lithography has been demonstrated a few years ago: entangled N-photon systems can improve the spatial resolution of an imaging system by a factor of N, despite the classical Rayleigh limit. Recently, a number of experiments successfully simulated certain features of quantum imaging and two-photon interference-diffraction by using chaotic light in coincidence detection experiments. Can classical light simulate the effect of imaging type quantum lithography? This article attempts to provide an answer to this currently debated question.

Citation Download Citation

Milena D'Angelo, Giuliano Scarcelli, and Yanhua Shih "Is entanglement dispensable in quantum lithography?", Proc. SPIE 6305, Quantum Communications and Quantum Imaging IV, 63050X (30 August 2006); https://doi.org/10.1117/12.696336

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