29 August 2006 Engineering photonic nanostructure profiles using nanosphere lithography and reactive-ion etching
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Abstract
Two-dimensional periodic structures with nanometer feature sizes have been widely used in many photonic devices. The profile and size of the nanostructure elements can greatly affect optical performances. Various practical subwavelength structures working in the visible and near infrared region have been fabricated using electron-beam writing or laser interference techniques. In this paper, we present a new technique which use nanosphere lithography (NSL) and reactive-ion etching to fabricate two-dimensional nanostructures with tunable nanoelement size and profile.
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Jinsong Wang, Jinsong Wang, Yang Zhao, Yang Zhao, Guangzhao Mao, Guangzhao Mao, } "Engineering photonic nanostructure profiles using nanosphere lithography and reactive-ion etching", Proc. SPIE 6308, Photonics for Space Environments XI, 63080H (29 August 2006); doi: 10.1117/12.679628; https://doi.org/10.1117/12.679628
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