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29 August 2006 EUV radiation from gas-puff laser plasma focused by multi-foil optics
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Abstract
We present the recent progress in high intensity micro focused EUV beam generation. Ellipsoidal thin glass foils were used in Multi-foil optical systems for focusing radiation in 50 eV to 150 eV energy band from gas-puff laser plasma source. Multifoil optic (MFO) condenser was designed and tested for applications with Xe laser plasma gas-puff source. High intensity EUV beam focal spot was recorded, analyzed and compared with theoretical results from computer ray-tracing. Direct EUV lithography using radiation induced decomposition and ablation of TEFLON was studied.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Pina, A. Bartnik, H. Fiedorowicz, R. Havlikova, R. Hudec, A. Inneman, K. Jakubczak, V. Semencova, and L. Sveda "EUV radiation from gas-puff laser plasma focused by multi-foil optics", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631705 (29 August 2006); https://doi.org/10.1117/12.684031
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