29 August 2006 Optical constants in the EUV soft x-ray (5÷152 nm) spectral range of B4C thin films deposited by different deposition techniques
Author Affiliations +
Abstract
B4C optical coating represents, together with Ir, Pt, SiC, one of best choice for high reflectance in the extreme ultraviolet region (EUV 160-30 nm). This material is also used in multilayer for soft X-ray applications, such as Si/B4C or W/B4C, or as interlayer in Mo/Si multilayer to avoid interdiffusion also because of its high thermal stability. Our work concerns on B4C thin films deposited on Si [100] substrates by means of three different deposition techniques: RF plasma magnetron sputtering, e-beam evaporation, pulsed laser ablation (PLD). We performed reflectance vs incidence angle measurements from 5 nm to 152 nm on different samples deriving the optical constants with a least-square fitting method. Complete films characterization have been carried out with compositional (XPS), structural (XRD) and morphological (AFM, SEM) analyses.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. Monaco, G. Monaco, D. Garoli, D. Garoli, R. Frison, R. Frison, V. Mattarello, V. Mattarello, P. Nicolosi, P. Nicolosi, M. G. Pelizzo, M. G. Pelizzo, V. Rigato, V. Rigato, L. Armelao, L. Armelao, A. Giglia, A. Giglia, S. Nannarone, S. Nannarone, "Optical constants in the EUV soft x-ray (5÷152 nm) spectral range of B4C thin films deposited by different deposition techniques", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631712 (29 August 2006); doi: 10.1117/12.684088; https://doi.org/10.1117/12.684088
PROCEEDINGS
12 PAGES


SHARE
Back to Top