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29 August 2006 Wave-optical simulations for designing and evaluating hard x-ray reflective optics
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Abstract
Focusing methods using mirror optics are intensively studied in the field of X-ray microscopy because mirror optics has useful features such as high photon efficiency and no chromatic aberrations. Employing a wave-optical method, we investigated the relationship between the nature of figure errors on the mirror surface and optics performances. We also evaluated glancing angle sensitivity to focused beam and beamwaist stuructures. Obtained results showed unprecedented degrees of surface figure accuracy such as higher than 4 nm was required to realize nearly diffraction limited nanobeam. This simulation can also give important information for align KB mirrors setup.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Mimura, S. Matsuyama, H. Yumoto, S. Handa, A. Shibatani, K. Katagishi, Y. Sano, Y. Nishino, M. Yabashi, K. Tamasaku, T. Ishikawa, and K. Yamauchi "Wave-optical simulations for designing and evaluating hard x-ray reflective optics", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631718 (29 August 2006); https://doi.org/10.1117/12.681944
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