AFM-based nanofabrication with femtosecond pulse laser radiation

Seungchul Kim; Seung-Woo Kim

doi:10.1117/12.678118

30 August 2006 AFM-based nanofabrication with femtosecond pulse laser radiation

Seungchul Kim, Seung-Woo Kim

Proceedings Volume 6324, Plasmonics: Nanoimaging, Nanofabrication, and their Applications II; 63240S (2006) https://doi.org/10.1117/12.678118
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

We report a preliminary result of scanning probe nanofabrication using an AFM (atomic force microscopy) tip with assistance of femtosecond laser pulses to enhance fabrication capability. Illumination of the AFM tip with ultra-short light pulses induces a strong electric field between the tip and the metal surface, which allows removing metal atoms from the surface by means of field evaporation. Computer simulation reveals that the intended field evaporation is triggered even in air when the induced electric field reaches the level of a few volts per nanometer, which is low enough to avoid unwanted thermal damages on most metal surfaces. For experimental validation, a Ti:sapphire femtosecond pulse laser with 10 fs pulse duration at 800 nm center wavelength was used with a tip coated with gold to fabricate nano-size holes on a thin film gold surface. Experimental results demonstrate that fine holes with a diameter of less than ~10 nm can be successfully made with precise control of the intensity of femtosecond laser pulses.

Citation Download Citation

Seungchul Kim and Seung-Woo Kim "AFM-based nanofabrication with femtosecond pulse laser radiation", Proc. SPIE 6324, Plasmonics: Nanoimaging, Nanofabrication, and their Applications II, 63240S (30 August 2006); https://doi.org/10.1117/12.678118

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