Paper
31 August 2006 Complex studies of properties of nanostructured silicon
A. I. Luchenko, M. M. Melnichenko, K. V. Svezhentsova, O. M. Shmyryeva
Author Affiliations +
Abstract
Nanocrystalline silicon layers ( 3-35nm ) have been formed upon single-crystal silicon substrates of very large area (100 cm2), multicrystalline silicon substrates and metallurgical silicon substrates by stain etching. We studied optical and structural properties of nanocrystalline silicon by photoluminescence, reflection, scanning tunnel microscopy, scanning electron microscopy, Auger electronic spectroscopy and SIMS methods. Researches of properties of nc-Si, received by a method of chemical processing, have confirmed an opportunity of creation of this multifunctional material with stable characteristics. The authors have observed the sensors systems with use of nanocrystalline silicon as a sensitive layer, which properties depend on thickness of a received layer and are controlled by parameters of technological process. On an example of the photoluminescent sensor with nc-Si layer it is shown, that such sensor can be successfully used for definition of small concentrations of toxins (pesticides phosalone 10-8-10-9 mol/l ), and also for specific biological pollutant, such as protein components, polysaccharides, cells used during biotechnological synthesis.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
A. I. Luchenko, M. M. Melnichenko, K. V. Svezhentsova, and O. M. Shmyryeva "Complex studies of properties of nanostructured silicon", Proc. SPIE 6327, Nanoengineering: Fabrication, Properties, Optics, and Devices III, 632716 (31 August 2006); https://doi.org/10.1117/12.680668
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Cited by 2 scholarly publications.
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KEYWORDS
Silicon

Etching

Sensors

Luminescence

Ultraviolet radiation

Reflection

Scanning electron microscopy

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