Planarization Profile Measurement Using A Confocal Scanning Laser Microscope

Ian R. Smith; Simon D. Bennett; James T. Lindow; Kevin Monahan

doi:10.1117/12.963721

20 August 1986 Planarization Profile Measurement Using A Confocal Scanning Laser Microscope

Ian R. Smith, Simon D. Bennett, James T. Lindow, Kevin Monahan

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963721
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

The use of planarizing layers to improve the performance of photolithography for micron and submicron devices is being actively explored by a number of semiconductor companies. The usefulness of the procedure depends critically upon the degree to which residual surface undulations can be controlled. This paper describes how a confocal scanning optical microscope may be used to measure surface profiles of planarizing layers and discusses the factors which influence the accuracy of measurement. Experimental measurements, using a SiScan-I system, of resist and P.S.G. planarizing layers are presented, demonstrating a sensitivity to surface height changes of 50 nm. The technique may be improved upon by careful design of the microscope and selection of the imaging wavelength. These factors are discussed.

Citation Download Citation

Ian R. Smith, Simon D. Bennett, James T. Lindow, and Kevin Monahan "Planarization Profile Measurement Using A Confocal Scanning Laser Microscope", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963721

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