Where Is The Lost Resolution?

Burn J. Lin

doi:10.1117/12.963701

20 August 1986 Where Is The Lost Resolution?

Burn J. Lin

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963701
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

In addition to raising the numerical aperture of the imaging lens or reducing the exposing wavelength to improve resolution in optical lithography, a third direction is pursued, namely restoration of the potential resolution capability that is lost due to incorrect practice. Unlike the former two methods, a gain in depth of focus can accompany improvement in resolution. In this paper, elimination of vibration between the mask and the wafer, resist contrast improvement, and multilayer resist systems are cited as possible means for improvement. Simulation study are given on the effects of vibration and resist contrast improvement to quantitatively assess the improvements.

Citation Download Citation

Burn J. Lin "Where Is The Lost Resolution?", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963701

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