8 September 2006 Sub-micron resolution three dimensional structure writing using two photon absorption process
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Proceedings Volume 6343, Photonics North 2006; 634326 (2006) https://doi.org/10.1117/12.707943
Event: Photonics North 2006, 2006, Quebec City, Canada
Abstract
Three-dimensional (3D) microstructure writing using the two photon absorption (TPA) process has potential applications in the fabrication of photonic crystals and micromechanical devices. Ormocore and SU-8, two commercially available photoresists, were used to produce 3D structures and compare their writing performances. A 40X objective (NA 0.65) was used to produce high aspect ratio structures with high resolution. The resultant widths and heights of the lines written in the resists were measured for various exposure conditions. Walls with ~320 nm width and aspect ratios of ~40 were produced in Ormocore. Other standing 3D structures were also written to demonstrate the capability of the resists.
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Zahidur R. Chowdhury, Robert Fedosejevs, "Sub-micron resolution three dimensional structure writing using two photon absorption process", Proc. SPIE 6343, Photonics North 2006, 634326 (8 September 2006); doi: 10.1117/12.707943; https://doi.org/10.1117/12.707943
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