8 September 2006 Modeling resist response in holographic formation of three-dimension photonic crystal templates
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Proceedings Volume 6343, Photonics North 2006; 63432Y (2006) https://doi.org/10.1117/12.710618
Event: Photonics North 2006, 2006, Quebec City, Canada
Abstract
A comprehensive model of holographic lithography is used to predict the final structure of a phasemask-formed photonic crystal in SU-8 photoresist. It includes optical imperfections in the phase mask, beam attenuation in the resist, and resist reaction kinetics such as acid diffusion, resist shrinkage and developer diffusion. By comparing simulations with the laser-formed PC templates in our lab, we can identify the origin of various crystal lattice distortions, and more accurately predict the template geometry and crystal motif.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ladan E. Abolghasemi, Debashis Chanda, and Peter R. Herman "Modeling resist response in holographic formation of three-dimension photonic crystal templates", Proc. SPIE 6343, Photonics North 2006, 63432Y (8 September 2006); doi: 10.1117/12.710618; https://doi.org/10.1117/12.710618
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