10 June 2006 Broadband source with high power supported by the combined effects of EDFA, Raman scattering, and parametric process
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Proceedings Volume 6344, Advanced Laser Technologies 2005; 634412 (2006) https://doi.org/10.1117/12.693522
Event: Advanced Laser Technologies 2005, 2005, Tianjin, China
Abstract
A broadband source (1520-1620nm) with output power of more than 200mW is achieved using only a single-wavelength pumping scheme dependent on the combined effects of stimulated Raman scattering, parametric process, and Erbium-doped fiber amplification.
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Fuyun Lu, Zhaohui Li, Yu Fan, Xiao Hann Lim, Jian Chen, Chao Lu, "Broadband source with high power supported by the combined effects of EDFA, Raman scattering, and parametric process", Proc. SPIE 6344, Advanced Laser Technologies 2005, 634412 (10 June 2006); doi: 10.1117/12.693522; https://doi.org/10.1117/12.693522
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