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26 April 2007 Excimer-laser-driven EUV plasma source for one-shot one-pattern projection microlithography
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Proceedings Volume 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 63460M (2007) https://doi.org/10.1117/12.738084
Event: XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2006, Gmunden, Austria
Abstract
We present the design elements and the preliminary experimental results of an Extreme-UltraViolet (EUV) exposure tool driven by the high-output-energy excimer laser-facility Hercules, which is aimed at printing a sub-100-nm-pattern on a photoresist in a single-shot irradiation.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. Di Lazzaro, G. Altieri, D. Amodio, S. Bollanti, A. Conti, F. Flora, T. Letardi, L. Mezi, D. Murra, E. Tefouet Kana, A. Torre, and C. E. Zheng "Excimer-laser-driven EUV plasma source for one-shot one-pattern projection microlithography", Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 63460M (26 April 2007); https://doi.org/10.1117/12.738084
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