26 April 2007 Spontaneous emission at 193 nm and gain measurements in F2 containing excimer gas mixtures
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Proceedings Volume 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 63460O (2007) https://doi.org/10.1117/12.738110
Event: XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2006, Gmunden, Austria
Abstract
The net gain and spontaneous emission at 193 nm have been measured in x-ray pre-ionized discharges excited by a single pulse charge transfer scheme in Ar and F2 containing mixtures with He and Ne as a buffer gas. With a pumping pulse of ~ 100 ns (FWHM) and a specific peak power deposition of ~ 1 MW cm-3 bar-1 in a gas mixture containing F2 : Ar : He (0.1% : 5% : 94.9%) at 2 bar total pressure the spontaneous emission with a peak intensity of ~ 200 W srad-1 and a pulse width (FWHM) of ~ 60 ns was measured. The net gain profile with a peak value ~ 20% cm-1 and a pulse width FWHM ~ 60 ns has been obtained under the same pumping conditions.
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A. V. Azarov, A. V. Azarov, P. J. M. Peters, P. J. M. Peters, K.-J. Boller, K.-J. Boller, } "Spontaneous emission at 193 nm and gain measurements in F2 containing excimer gas mixtures", Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 63460O (26 April 2007); doi: 10.1117/12.738110; https://doi.org/10.1117/12.738110
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