26 April 2007 Micro- and nanoprocessing of organic polymers using a laser plasma XUV source
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Proceedings Volume 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 63461H (2007) https://doi.org/10.1117/12.738157
Event: XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2006, Gmunden, Austria
Abstract
Laser plasmas generated in result of interaction of intense laser pulses with matter are efficient sources of XUV radiation in the energy range from about 50 eV to 500 eV. The results of experiments on micro- and nanoprocessing of organic polymers using a laser plasma XUV source based on a laser-irradiated gas puff target are presented and discussed.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henryk Fiedorowicz, Henryk Fiedorowicz, Andrzej Bartnik, Andrzej Bartnik, Roman Jarocki, Roman Jarocki, Libor Juha, Libor Juha, Jerzy Kostecki, Jerzy Kostecki, Rafal Rakowski, Rafal Rakowski, Miroslaw Szczurek, Miroslaw Szczurek, } "Micro- and nanoprocessing of organic polymers using a laser plasma XUV source", Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 63461H (26 April 2007); doi: 10.1117/12.738157; https://doi.org/10.1117/12.738157
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