Atomic iodine production by decomposing CF3I in RF discharge

Guofu Li; Fengting Sang; Liping Duo

doi:10.1117/12.739093

26 April 2007 Atomic iodine production by decomposing CF₃I in RF discharge

Guofu Li, Fengting Sang, Liping Duo

Proceedings Volume 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers; 63462H (2007) https://doi.org/10.1117/12.739093
Event: XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 2006, Gmunden, Austria

Abstract

By means of radio frequency(RF) capacitively coupled discharge, pure CF₃I and the mixture of CF₃I and various inert gases were used to produce iodine atom for a chemical oxygen-iodine laser. The dependences of atomic iodine concentration on gas pressure and gas flow rate were studied. In the case of RF frequency of 13.56MHz, output power of 500W, gas pressure of 3.5Torr, pure CF₃I without any carrier gas ,and CF₃I flow rate of 1.2SLM, atomic iodine concentration of 4.0×10¹⁴ cm^-3 was achieved. The concentration of atomic iodine was of the order of 0.4×10¹⁴cm^-3 at p=15Torr in the case of the mixture of CF₃I and some inert gases, which was lower by one order of magnitude than that of pure CF₃I. A kinetics modeling was carried out and demonstrated that CF₃ played dominant role in the loss mechanism of atomic iodine.

Citation Download Citation

Guofu Li, Fengting Sang, and Liping Duo "Atomic iodine production by decomposing CF₃I in RF discharge", Proc. SPIE 6346, XVI International Symposium on Gas Flow, Chemical Lasers, and High-Power Lasers, 63462H (26 April 2007); https://doi.org/10.1117/12.739093

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