20 October 2006 Design-based mask metrology hot spot classification and recipe making through random pattern recognition method
Author Affiliations +
Abstract
Design Based Metrology (DBM) requires an integrated process from design to metrology, and the very first and key step of this integration is to translate design CD lists to metrology measurement recipes. Design CD lists can come from different sources, such as design rule check, OPC validation, or yield analysis. These design CD lists can not be directly used to create metrology tool recipes, since tool recipe makers usually require specific information of each CD site, or a measurement matrix. The manual process to identify measurement matrix for each design CD site can be very difficult, especially when the list is in hundreds or more. This paper will address this issue and propose a method to automate Design CD Identification (DCDI), using a new CD Pattern Vector (CDPV) library.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ying Cui, Ying Cui, Kiho Baik, Kiho Baik, Bob Gleason, Bob Gleason, Malahat Tavassoli, Malahat Tavassoli, } "Design-based mask metrology hot spot classification and recipe making through random pattern recognition method", Proc. SPIE 6349, Photomask Technology 2006, 63490O (20 October 2006); doi: 10.1117/12.690988; https://doi.org/10.1117/12.690988
PROCEEDINGS
6 PAGES


SHARE
RELATED CONTENT

A novel design based global CDU metrology for 1X nm...
Proceedings of SPIE (September 30 2013)
Application of HT-PSM to 180-nm logic devices
Proceedings of SPIE (December 17 1998)
Effects of complementary phase-shift imaging on gate CD control
Proceedings of SPIE (September 13 2001)
Advanced Cr dry etching process
Proceedings of SPIE (August 24 1999)

Back to Top