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20 October 2006 Real-time monitoring based on comprehensive analysis of the haze environment under the pellicle film
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Abstract
It is important to understand how the outgassed chemicals from pellicle materials are involving in various surface reactions towards haze defect formation on the mask surface during the exposure. In this work, we have analyzed the gaseous environment and the substrate surface under laser exposure in the specially designed quartz tube filled by air, or N2. We observed that various chemicals that consist of the pellicle film are outgassed from the film and then deposited or interact with other chemicals to make haze defects on the substrate surface during laser exposure. This fact can be further applied not only to the study of pellicle outgassing effect on haze defect growth mechanism but also to the development of real-time monitoring tools for the defect growth progress on the mask surface.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jaehyuck Choi, Seungyeon Lee, Eunjung Kim, Il-woo Nam, Byung-Cheol Cha, Seong-Woon Choi, and Woo-Sung Han "Real-time monitoring based on comprehensive analysis of the haze environment under the pellicle film", Proc. SPIE 6349, Photomask Technology 2006, 63491I (20 October 2006); https://doi.org/10.1117/12.685774
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