Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique

Abani M. Biswas; Jianliang Li; Jay A. Hiserote; Lawrence S. Melvin III

doi:10.1117/12.692285

20 October 2006 Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique

Abani M. Biswas, Jianliang Li, Jay A. Hiserote, Lawrence S. Melvin III

Author Affiliations +

Proceedings Volume 6349, Photomask Technology 2006; 63491P (2006) https://doi.org/10.1117/12.692285
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

Immersion lithography and multiple exposure techniques are the most promising methods to extend lithography manufacturing to the 45nm node. Although immersion lithography has attracted much attention recently as a promising optical lithography extension, it will not solve all the problems at the 45-nm node. The 'dry' option, (i.e. double exposure/etch) which can be realized with standard processing practice, will extend 193-nm lithography to the end of the current industry roadmap. Double exposure/etch lithography is expensive in terms of cost, throughput time, and overlay registration accuracy. However, it is less challenging compared to other possible alternatives and has the ability to break through the κ₁ barrier (0.25). This process, in combination with attenuated PSM (att-PSM) mask, is a good imaging solution that can reach, and most likely go beyond, the 45-nm node. Mask making requirements in a double exposure scheme will be reduced significantly. This can be appreciated by the fact that the separation of tightly-pitched mask into two less demanding pitch patterns will reduce the stringent specifications for each mask. In this study, modeling of double exposure lithography (DEL) with att-PSM masks to target 45-nm node is described. In addition, mask separation and implementation issues of optical proximity corrections (OPC) to improve process window are studied. To understand the impact of OPC on the process window, Fourier analysis of the masks has been carried out as well.

Citation Download Citation

Abani M. Biswas, Jianliang Li, Jay A. Hiserote, and Lawrence S. Melvin III "Extension of 193 nm dry lithography to 45-nm half-pitch node: double exposure and double processing technique", Proc. SPIE 6349, Photomask Technology 2006, 63491P (20 October 2006); https://doi.org/10.1117/12.692285

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