Influence of design shrinks and proximity influence distance on flattening of optical hierarchy during RET

John L. Nistler; Koby Duckworth

doi:10.1117/12.686359

20 October 2006 Influence of design shrinks and proximity influence distance on flattening of optical hierarchy during RET

John L. Nistler, Koby Duckworth

Author Affiliations +

Proceedings Volume 6349, Photomask Technology 2006; 634925 (2006) https://doi.org/10.1117/12.686359
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

As geometries shrink faster than the actual wavelength used for exposure, the Proximity influence distance, or PID of nearest neighbor features starts to impact not only the overall RET of unit cells in the design library but also the flattening of the hierarchy of the electronic design increasing the overall database size, computational times and respective memory requirements per computational node. In this paper we explore the impact of different PID values in relation to the overall flattening of hierarchy, time to market and the impact on RET complexity as dimensions are shrunk in overall design.

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John L. Nistler and Koby Duckworth "Influence of design shrinks and proximity influence distance on flattening of optical hierarchy during RET", Proc. SPIE 6349, Photomask Technology 2006, 634925 (20 October 2006); https://doi.org/10.1117/12.686359

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