20 October 2006 Benchmarking the productivity of photomask manufacturers
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Abstract
A survey-based, empirical study that benchmarks the productivity of photomask manufacturers has led to some significant conclusions. Firstly, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Secondly, the high downtime of pattern generation tools is limiting productivity. Thirdly, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
C. Neil Berglund, Charles M. Weber, Patricia Gabella, "Benchmarking the productivity of photomask manufacturers", Proc. SPIE 6349, Photomask Technology 2006, 634927 (20 October 2006); doi: 10.1117/12.686227; https://doi.org/10.1117/12.686227
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