We created haze defects on the PSM mask surface using ArF haze accelerator while the mask was
previously cleaned by SPM and SC1 solutions. Then we directly analyzed the defects on the surface using TOF-SMS.
The comprehensive analysis of TOF-SIMS signifies that the defects mainly consist of hydrocarbons, Na, K, Cl, F, Mg,
Al, etc., which have probably come from previous procedures, fab environments, storage materials, handling steps, or
pellicle materials. This fact implies the exclusion of sulfate or ammonium ions from the mask surface should not be
enough for the realization of haze-free PSM masks. In addition, complete removal of residual hydrocarbons deposited
through previous procedures and perfect protection against environmental contaminants from fab air, storage materials,
handling steps, or pellicle materials should be further accomplished.