Defining defect specifications to optimize photomask production and requalification

Peter Fiekowsky

doi:10.1117/12.706646

20 October 2006 Defining defect specifications to optimize photomask production and requalification

Peter Fiekowsky

Proceedings Volume 6349, Photomask Technology 2006; 63493R (2006) https://doi.org/10.1117/12.706646
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

Reducing defect repairs and accelerating defect analysis is becoming more important as the total cost of defect repairs on advanced masks increases. Photomask defect specs based on printability, as measured on AIMS microscopes has been used for years, but the fundamental defect spec is still the defect size, as measured on the photomask, requiring the repair of many unprintable defects. ADAS, the Automated Defect Analysis System from AVI is now available in most advanced mask shops. It makes the use of pure printability specs, or "Optimal Defect Specs" practical. This software uses advanced algorithms to eliminate false defects caused by approximations in the inspection algorithm, classify each defect, simulate each defect and disposition each defect based on its printability and location. This paper defines "optimal defect specs", explains why they are now practical and economic, gives a method of determining them and provides accuracy data.

Citation Download Citation

Peter Fiekowsky "Defining defect specifications to optimize photomask production and requalification", Proc. SPIE 6349, Photomask Technology 2006, 63493R (20 October 2006); https://doi.org/10.1117/12.706646

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