On objectives and algorithms of inverse methods in microlithography

Yuri Granik; Kyohei Sakajiri; Shumay Shang

doi:10.1117/12.691810

20 October 2006 On objectives and algorithms of inverse methods in microlithography

Yuri Granik, Kyohei Sakajiri, Shumay Shang

Proceedings Volume 6349, Photomask Technology 2006; 63494R (2006) https://doi.org/10.1117/12.691810
Event: SPIE Photomask Technology, 2006, Monterey, California, United States

Abstract

Inverse microlithography solves problem of finding the best mask to print target layout. We present theoretical analysis of objective functions and algorithms that are used for inversion. We analyze complexity, speed and limitations of the inverse algorithms.

Citation Download Citation

Yuri Granik, Kyohei Sakajiri, and Shumay Shang "On objectives and algorithms of inverse methods in microlithography", Proc. SPIE 6349, Photomask Technology 2006, 63494R (20 October 2006); https://doi.org/10.1117/12.691810

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