Translator Disclaimer
Paper
20 October 2006 On objectives and algorithms of inverse methods in microlithography
Author Affiliations +
Abstract
Inverse microlithography solves problem of finding the best mask to print target layout. We present theoretical analysis of objective functions and algorithms that are used for inversion. We analyze complexity, speed and limitations of the inverse algorithms.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuri Granik, Kyohei Sakajiri, and Shumay Shang "On objectives and algorithms of inverse methods in microlithography", Proc. SPIE 6349, Photomask Technology 2006, 63494R (20 October 2006); https://doi.org/10.1117/12.691810
PROCEEDINGS
8 PAGES


SHARE
Advertisement
Advertisement
Back to Top