5 October 2006 Sidelobe reduction in Si photonic wire AWG
Author Affiliations +
Proceedings Volume 6352, Optoelectronic Materials and Devices; 635205 (2006) https://doi.org/10.1117/12.690948
Event: Asia-Pacific Optical Communications, 2006, Gwangju, South Korea
We designed and fabricated an arrayed waveguide grating demultiplexer of 70 × 75 μm2 size, which consists of Si slab and wire waveguides on silicon-on-insulator substrate. By optimizing the connection between components and the layout of arrayed waveguides, the internal light scattering and the phase error were suppressed. As a result, the clear demultiplexing characteristics were observed with a channel spacing of 8 nm and a sidelobe level of -22 dB in the wavelength range around 1.55 μm.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kosuke Sasaki, Kosuke Sasaki, Fumiaki Ohno, Fumiaki Ohno, Ayumu Motegi, Ayumu Motegi, Toshihiko Baba, Toshihiko Baba, } "Sidelobe reduction in Si photonic wire AWG", Proc. SPIE 6352, Optoelectronic Materials and Devices, 635205 (5 October 2006); doi: 10.1117/12.690948; https://doi.org/10.1117/12.690948

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