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29 May 2007Optical spatial heterodyned interferometry for inspection of microelectromechanical systems
Interferometric imaging has the potential to extend the usefulness of optical microscopes by encoding small phase shifts
that reveal information about topology and materials. At the Oak Ridge National Laboratory (ORNL), we have
developed an optical Spatial Heterodyne Interferometry (SHI) method that captures reflection images containing both
phase and amplitude information at a high rate of speed. By measuring the phase of a wavefront reflected off or
transmitted through a surface, the relative surface heights and some materials properties can be measured. In this paper
we briefly review our historical application of SHI in the semiconductor industry, but the focus is on new research to
adapt this technology to the inspection of MEMS devices, in particular to the characterization of motion elements such
as microcantilevers and deformable mirror arrays.
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Kenneth W. Tobin, Philip R. Bingham, Jeffery R. Price, "Optical spatial heterodyned interferometry for inspection of microelectromechanical systems," Proc. SPIE 6356, Eighth International Conference on Quality Control by Artificial Vision, 63560G (29 May 2007); https://doi.org/10.1117/12.736740