Changing temperature characters analysis along the axes of the thermal-excited silicon resonant beam

Haihan Zhuang; Shangchun Fan; Zhiping Peng

doi:10.1117/12.717501

28 October 2006 Changing temperature characters analysis along the axes of the thermal-excited silicon resonant beam

Haihan Zhuang, Shangchun Fan, Zhiping Peng

Proceedings Volume 6358, Sixth International Symposium on Instrumentation and Control Technology: Sensors, Automatic Measurement, Control, and Computer Simulation; 635807 (2006) https://doi.org/10.1117/12.717501
Event: Sixth International Symposium on Instrumentation and Control Technology, 2006, Beijing, China

Abstract

According to the sensing structure of a practical silicon resonant pressure micro sensor whose preliminary sensing unit is a square silicon diaphragm, and the final sensing unit is a silicon beam resonator, this paper analyzed the distribution character of the changing temperature along the abscissa of the beam. With regard to the solution of the diffusion equation, it can be concluded that the changing temperature and the input power have the same frequency accurately, the range where the changing temperature exists is confined to a finite area, and a gap appears at the edge of the thermal resistor during the changing procedure. Hoping these conclusions is helpful of the more reasonable design.

Citation Download Citation

Haihan Zhuang, Shangchun Fan, and Zhiping Peng "Changing temperature characters analysis along the axes of the thermal-excited silicon resonant beam", Proc. SPIE 6358, Sixth International Symposium on Instrumentation and Control Technology: Sensors, Automatic Measurement, Control, and Computer Simulation, 635807 (28 October 2006); https://doi.org/10.1117/12.717501

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