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19 October 2006 Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition
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Proceedings Volume 6376, Optomechatronic Micro/Nano Devices and Components II; 637602 (2006) https://doi.org/10.1117/12.690807
Event: Optics East 2006, 2006, Boston, Massachusetts, United States
Abstract
Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga+ focused-ion-beam chemical-vapor-deposition (FIB-CVD) using a phenanthrene (C14H10) source as a precursor. Microstructure plastic arts is advocated as a new field using micro-beam technology, presenting one example of micro-wine-glass with 2.75μm external diameter and 12μm height. The deposition film is a diamondlike amorphous carbon. A large Young's modulus that exceeds 600 GPa seems to present great possibilities for various applications. Producing of three-dimensional nanostructure is discussed. Micro-coil, nanoelectrostatic actuator, and nano-space-wiring with 0.1μm dimension are demonstrated as parts of nanomechanical system. Furthermore, nanoinjector and nanomanipulator are also fabricated as a novel nano-tool for manipulation and analysis of subcellular organelles.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shinji Matsui "Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition", Proc. SPIE 6376, Optomechatronic Micro/Nano Devices and Components II, 637602 (19 October 2006); https://doi.org/10.1117/12.690807
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