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18 October 2006 Two-photon photopolymeric micro-nano fabrication for polymer device application
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Proceedings Volume 6376, Optomechatronic Micro/Nano Devices and Components II; 63760F (2006)
Event: Optics East 2006, 2006, Boston, Massachusetts, United States
We have demonstrated the technology to fabricate a polymer sub-micrometer structure by two-photon-induced photopolymerization. Since photopolymerization resin contained conventional laser-dye and polymer host, we could obtain optically active polymer structures such as laser microcavities and photonic crystals. We have been investigating the polymer material for use it as an optical high gain medium, and found that a spherical macromolecule, called as dendrimer, could be especially useful for our applications. Observed optical response attributes to the site-isolation effect of dendrimer, which limits cluster formation and intermolecular energy transfer, promising a high level of optical gain. We utilized these effects for two-photon induced laser lithography, which is often sensitive to the energetically quenching problems. From the viewpoint of the extension of the polymer material to the optical device application, it is important to consider the device dimensions with a scale of sub-micromeres. We investigate both the material functions in the molecular scale and controlling the device structure for desired applications such as a polymer DFB and photonic crystal.
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Shiyoshi Yokoyama, Tatsuo Nakahama, and Hideki Miki "Two-photon photopolymeric micro-nano fabrication for polymer device application", Proc. SPIE 6376, Optomechatronic Micro/Nano Devices and Components II, 63760F (18 October 2006);

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